In-situ growth and characterization of ultra-thin films for nanoelectronic applications
Epitaxial ultra-thin films play a central role in the development of advanced nanoelectronic applications. Recently, we have developed an unique scientific infrastructure for ultra-thin film research, including growth, implantation and analysis of materials in an ultra-high vacuum chamber.
Join this project, and you will learn:
- Growth of epitaxial ultra-thin films using e-beam evaporation, sputtering and annealing.
- Characterization of materials using in-situ 3D-MEIS and relevant ion beam analysis techniques.
- Ex-situ characterization using electron microscopy (SEM and S/TEM).
For more information, please email: email@example.com
References: Phys. Rev. A 100, 032705 (2019); Sci. Rep. (2020) 10:10249; App. Surf. Sci. 536 (2021) 147781.